David Griffith wrote: > On Sat, 19 Nov 2005, Russell Shaw wrote: > >>David Griffith wrote: >> >>>I've acquired a roll of liquidated Aqua-Mer PR photoresist film that I >>>intend to cut up into smaller quantities for sale on Ebay (toot! toot!). >>>My question: what is the correct developer? I picked up a bottle from a >>>downtown shop that turned out to be a sodium hydroxide solution, which I'd >>>rather not mess with given that it's relatively unforgiving with >>>overdevelopment. >> >>Sodium hydroxide is stripper. Try 10g/L sodium carbonate at 25-30degC. > > I remember sodium silicate being referenced as a developer. Is that only > for positive spray resist? It may work too. I'm not so familiar with all the chemical alternatives. I couldn't find references on google. To use sodium silicate for positive resist, it can be mixed with sodium hydroxide: http://members.lycos.nl/anthonyvh/index.php?page=pcb
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Re: [Homebrew_PCBs] developing Aqua-Mer PR photoresist film
2005-11-19 by Russell Shaw
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