Slavko Kocjancic <eslavko@...> writes: > Does someone know what energy is nedded to develop photoresist? Here's an example: http://www.thinktink.com/stack/volumes/voli/store/specs/m115spec.htm The key parameter is "energy" in mJ/cm2 (millijoules per square centimeter) To truly calibrate a system, though, you need to do a test exposure through a transmission step wedge, like: http://www.stouffer.net/TransPage.htm http://www.thinktink.com/stack/volumes/volvi/filmimag.htm#Calibration The wedge allows you to do a range of "exposures" at one time, and since it's calibrated(ish) the results tell you what actual exposure to use. For example, if you do a test run at 10 cm/sec laser travel, and the results are "held at step 10" but the resist says it wants step 8, and you're using a 21-step wedge (1.414x per step), you need to double the laser speed to 20 cm/sec or cut the energy in half.
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Re: [Homebrew_PCBs] Energy for developing
2012-01-12 by DJ Delorie
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