I'm interested in that approach too. But little extended. The old fashion PCB process have aperture wheel. and there was different shapes on it. So instead just thiny dot there can be bigger dot's too. And this can speed up process a lot. Now the light source. It's need to be UV period. And some laser's can do that but there is problem as we can't(easy) build that as is invisible and commercial UV laser (0.5 to 1W) isn't cheap. The scrap source is blueRAY disc. But managing the optic is near inposible. The other source is UV LED. But led light should be collimated too. But least the UV led has little visible light so we can manage to focus them. Another UV source is mercury light. It's just BIG but can be used. We just need to know how long the dot must be developed and then we know if process is ussable or it's to slow.
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Re: [Homebrew_PCBs] Re: Novel way to expose photo resist??
2012-02-24 by Slavko Kocjancic
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