--- In Homebrew_PCBs@yahoogroups.com, Adam Seychell <a_seychell@...> wrote: > > I've been experimenting with some UV LEDs for building an exposure unit. > I'm using the negative dry film photoresist and discovered to my > surprise that there is a limitation on minimum light intensity. If the > intensity its too low then no amount of time will cause photo > polymerisation of the resist. > For example, one LED I tested at 15mA, 120mm distance did not cause any > polymerisation in 40 minutes. The same LED at 30mm distance, 20mA, took > only 30 second for polymerisation. > > I found if the light cannot expose the resist within about 2 or 3 > minutes then the photoresist do not seem to react at all. At boarder > line UV intensity, it partly polymerises leaving behind a soft matted > looking resist after development. > > This imposes a design constraint on anyone who wants to make a LED > exposure unit must because it there will be a minimum density of LEDs > needed in the array. So far I've only experimented with single LED > exposures. I'll make a 9 x 9 array for testing. > Definitely very peculiar. I would expect the exposure time to go up with the square of the distance. So a four times increase in distance would result in a 16 times exposure time. In your case it should have taken 8 minutes. Do you have any kind of material that fluouresces when you shine the LEDs to see if there is uniform emission. I wonder if the UV could be getting emitted in a ring pattern. If that were the case, when you get too far away, the UV would not be hitting the resist. I bought the Best HongKong LEDs as well. I received a notice from the post office that I have to pick them up. When I get them I will try the same kind of experiment to see what happens.
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Re: UV LED + photoresist experiments
2008-02-28 by javaguy11111
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