*** None of us has military decontamination tents in our gardens to do the etching in if that's what you are asking ;-) If you are using the low strength H2O2 (3%) the upper limit of reasonable concentration would be mixing two parts of it straight with one part 30% HCl. This will give a very strong etchant that'll fume a little so ventilation during or after etching is advised, but would not be too crazy. Care must be taken if you user stronger H2O2, then diluting the HCl first is most definitely called for. Storing the etchant makes little sense if you only have low concentration H2O2, it can not be practically used to make CuCl etchant because it contains too much water to allow the necessary repeated addition of fresh H2O2. *** So what concentration of H202 do we need if we are interested in making CuCl etchant then? Thanks, -- Newell
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Corrosion + Ventilation (PCB creation at home)
2010-02-07 by Newell S Jensen
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