Thus far I have had great success with toner transfer and CuCl from my very first etch. I did a bunch of PCBs 30 years using a resist pen and FeCl, but these are the first boards I have made since then. I have, however, noticed something that I have not seen reported in all that I have read on the topic. I am using 20% HCl and "40 volume" hair developer which is 12% H2O2 plus a bunch of stabilizers. When mixed 2 parts H2O2 to one part HCl, the product is very reactive and can etch 1 oz. copper in 30 seconds - 1 minute depending on the amount of action on the board. However, this etchant seems to degrade rapidly over 24 hours. It will still etch the following day, but *very* slowly -- 30 minutes or more to etch the same 1 oz. copper. Oddly, I have never seen the equation for the generation of CuCl2 with H2O2, but I believe it to be roughly the following: 2 HCl + Cu + H2O2 -> CuCl2 + 2 H2O I say roughly because there is clearly a gas produced during the etch. While this could be water vapor, I am not certain of it. In any case, I believe what is going on is that I am only producing a minimal amount of CuCl2, and something is causing the H2O2 to degrade when it sits. At this point, I merely have a (diluted) acidic solution with very low CuCl2 content. This would explain the vast difference in etch times when the only variable is time (the time it sat on the shelf). I suspect that if I had etched more copper before the H2O2 degraded, I would have produced more CuCl2, and thus would have had a much more concentrated solution for future CuCl2 etching. I *have* seen some references to people mixing up very small quantities of 35% H2O2 + HCl, and I wonder if they are only using the HCl + H2O2 phase, and not actually bothering with the CuCl2 etch. I think in the future I will be mixing up much smaller batches of HCl + H2O2 and then perhaps tossing in some scrap copper to produce CuCl2 while the H2O2 is still present. Any ideas if I am correct of this? Am I merely re-discovering common knowledge of this list? Are there many people who only use the first phase due to its insanely fast etch times? -p.
Message
Observations on CuCl2 etching
2014-05-12 by Peter Johansson
Attachments
- No local attachments were found for this message.